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SSY-10000 (Table-top loader system for 100mm wafer)Wafer Transfer System

SSY-10000

Product Video

Usage Environment/Specifications

Product Profile

Product Model	SSY-10000
Environment	Clean room atmosphere
Operating Range	225mm (Distance to wafer center)
Wafer Size	Up to 100mm
Carrying Object	Glass, sapphire, SiC, or GaN or other wafers
Carrying Object	Contact us for the detailed specifications.
Payload Capacity	0.1kg (Wafer only)

The image above and the video are of SSY-10000 (Table-top loader system for 100mm wafer).

Characteristics

For various types of wafers; 2, 3 inch, 100mm glass, sapphire, SiC, or GaN or others.
Customization is available.

Compact system integrating wafer inspection stage into wafer handling system.
Long stroke of 190mm X-axis and 200mm Y-axis. Wafer stage position can be manually adjusted with a handle.
Twin end-effector reduces the wafer swap time.
Low-cost & high-performance system combining robot and passive type alignment stage.

Standard Specifications

Operating Range	From the robot center to the wafer center	Rotation Angle (Theta-axis)	Vertical Stroke (Z-axis)
Carrying Object	Up to 100mm wafer (glass, sapphire, SiC, or GaN or others)
Operating Range	225mm	360deg	150mm
Carrying Speed (Ave.)	Arm (R-axis)	Rotation Angle (Theta-axis)	Vertical Stroke (Z-axis)
Carrying Speed (Ave.)	225mm/sec	500deg/sec	200mm/sec
Carrying Speed (Max.)	Arm (R-axis)	Rotation Angle (Theta-axis)	Vertical Stroke (Z-axis)
Carrying Speed (Max.)	300mm/sec	700deg/sec	300mm/sec
Wafer Holding Method	By vacuum suction
Repeatability	Within ±0.1mm
Cleanliness	ISO Class 2 (at wafer transfer level when exhausting driving part)
Mass	Approx. 15kg (Robot)
Utility	Power: AC100V±10% 0.2kVA Vacuum: -53kPa or more

Outline Drawing (Standard)

Option

Other Option

Icon guide

...Atmosphere
...Vacuum
...Waterproof
...Single arm
...Twin arm
...Thin wafer
...CE marking
...JEL's standard spec.
...KCs marking